■ Website: www.copyright.gov

■

Address: U.S. Copyright Office, 101 Independence Ave. S.E., Washington, Washington, Washington, Washington, Washington, D.C. 20559-6000

Mask works (Mask Work)\" is a series of related images (IMAGE). Whether these images are fixed or encoded, it (1) has a possession Or show the predetermined three -dimensional pattern of metal, insulation or semiconductor materials, which exist on each layer of semiconductor chip products, or is removed from various layers; and (2) in these series, the relationship between images is each one is every each of them is each one. The images have a form of surface pattern in a form of semiconductor chip products.

The protection of mask works

The \"mask work\" in the United States, my country is called \"integrated circuit cloth design\". Although these cloth maps are functional, as long as the mask works are not determined by specific electronic functions, and they are not one of the only optional designs that implement the function, the mask works are still protected. However, the protection will not extend to any ideas, procedures, processes, processes, systems, operation methods, concepts, principles, or discovery, or discovery, or in which method in the mask works Or reflect.

In the United States, the protected mask works must meet the following conditions:

Originality

The mask works should be original, not plagiarism. The mask works cannot only include the common design in the semiconductor industry, nor can it be a variant of these designs in a way that is not an original way.

Appropriateness (Eligibility)

Any original mask work fixed in semiconductor chip products by the owner of the mask or authorized by the mask work, if it meets one of the following conditions, is eligible to obtain protection:

(1) The date of the registered works registered in the US Copyright Administration, or the date of commercial development for the first time in the world for commercial development. Owner

a. Is a residence in the United States or a residence in the United States;

b. His nationality, residence, or country belongs to the United States. The country and the United States are members of the international treaty of a protective cover work;

C. No nationality.

(2) The mask works are first carried out in the United States.

(3) The area that is an enlarged and protected scope announced by the President of the United States. The owner is residents in these regions, first commercial development in these regions, or areas with national treatment with each other with these regions.

Protection period

Mask works In the United States' protection period on the date of registration from the US Copyright Administration, or for the first time in the world to develop the mask work, Earlier, the protection period was 10 years (ending at the end of the 10th calendar year from the beginning).

3. Register

Briefly explain the storage objects for identifying materials, such as color covering acetate fibrous slices or composite plots. 3-5. Information about the current everyone

If the founder is late or has no ability to act in law; (3) someone who creates mask works for the creation of mask works within the scope of work; (4) the transfer of ownership.

If the space provided by the MW table is not enough, the continuation sheet can be used. Provide the citizenship or residence of the current everyone in item 4.

If everyone is not the founder who applied for mask works, the corresponding option must be selected in item 5 to explain why everyone has the right to protect the mask work. If everyone is a company or organization, one of them must be selected.

6. The date and the country's first business development (Date and National ExploitaTion)

Commercial development mask work refers to providing the public with semiconductor chip products that reflect the mask works for the purpose of business.

The offer for sale or transfer semiconductor chip products can only be identified as commercial development only after the offer appears in writing and occurs in the mask work in semiconductor chip products.

If the mask works that have been applied have been developed anywhere in the world, the applicant should fill in the exact date and the country / region that develops for the first time. If the work has not been developed, there is no need to fill in item 6.

7. At the first commercial development, everyone's citizenship or residence

The nationality or residence of the owner of the mask that was developed by commercial development during development.

If the application of the application for the application has been developed by commercial development, and the nationality or residence of everyone during the first commercial development is different from the fourth item, it must be filled in item 7.

8. Innovative nature

(Nature of Contribution)

mask works usually include the pre -conducting material in the semiconductor industry. Such materials are inseparable. However, if they are combined in an original way, this new creator identity can be protected. In other words, the parts that have been developed before, or the registered parts that have been registered cannot be included in claims.

The applicant should provide a short general instructions to describe the protected innovation that can be used as the basis of its claim. If it is applicable, the description can quote any of the previous mask works based on the registered mask work to help distinguish between innovation points and existing works. It should be noted that protection does not extend to the function of semiconductor chip products.

9． Contact information

(CorresPondence)

If you need more information, fill in the name, address, email and telephone number during the day.

10. Deposit account

11. Prove

(Certification)

The person who has the right to prove that the facts claimed in the application must sign on the application.

12.Certificate mailing address

(Address for Return of Certification

Name and address must be clearly filled in.Essence

4.Fees

Project

Cost

(USD)